Chinese startup claims photonic chip production without DUV lithography, 90% cost cut

A Chinese startup has announced photonic chip production on 8-inch wafers using nanoimprint lithography instead of expensive deep-UV (DUV) systems, claiming a 90% cost reduction. The process bypasses traditional optical lithography entirely, potentially opening access to chip fabrication for economies without advanced fab infrastructure.

For semiconductor supply-chain planners, this signals emerging alternatives to ASML DUV monopoly, though yield validation and production scaling remain unproven at scale.