Imec builds first High-NA EUV quantum dot qubit using next-gen fab process

Imec has successfully fabricated the world's first quantum dot qubit device using High-NA EUV (extreme ultraviolet) lithography—a manufacturing breakthrough that could integrate quantum computing onto the same advanced process node roadmap as AI accelerators. The achievement compresses what were previously separate technology development timelines.

For AI infrastructure planners, this convergence matters: quantum-classical hybrid compute on a single next-gen node could enable specialized quantum-accelerated workloads (optimization, simulation) alongside inference pipelines on standard leading-edge fabs. Imec's result validates that High-NA EUV is production-ready for both classical and quantum lithography challenges.